Thin Film Metrology

Critical data, a unique approach

X-ray analytical techniques – based on X-ray fluorescence (XRF), X-ray diffraction (XRD) and X-ray reflectometry (XRR) - are well established non-destructive and accurate tools for critical testing of semiconductors and advanced materials. They provide precise information about important material parameters such as composition, layer thickness, roughness, density, strain and relaxation - not just for single layers, but also for the most complicated thin layered structures.

PANalytical leadership

With a long history in materials characterization PANalytical is continuously improving and extending the application area of thin film analysis in order to meet the demands and challenges of today’s and tomorrow’s advanced materials industries. This results in tools based on the latest cutting-edge technologies. PANalytical offers solutions from the R&D lab to pilot production and volume production with accompanying 24/7 reliability, global service and support.

PANalytical is unique among instrument manufacturers, who have always specialized in instruments for either research and development, or production. Our approach simplifies the hand-over from R&D to pilot (and even volume production lines) in the silicon, data storage and compound semiconductor industries.

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