In the semiconductor industry, the rapidly decreasing dimensions of devices have required continuous improvement and adaptation of metrology techniques. The films that make up these devices have become thinner and contain an increased variety of elements.
X-ray metrology techniques have kept up with this progression through the development of new applications and technologies and they continue to serve as essential tools from the R&D phase through pilot production to full-scale automated manufacturing of semiconductor devices.
PANalytical: a reliable partner for silicon semiconductor industries
PANalytical has developed X-ray metrology by combining cutting-edge technology with unprecedented application support and service, making their offering unique in the semiconductor industry.
The 2830 ZT determines composition, thickness and surface uniformity of semiconductor films and stacks, by measuring elements from B to U. In addition to best-in-class precision, the 2830 ZT offers unprecedented uptime as a result of the elimination of tube intensity drift through ZETA technology. Thanks to this unique feature, calibration maintenance and drift correction are minimized, and system uptime is maximized.
The X'Pert³ MRD (Materials Research Diffractometer) is the most flexible system for studying all structural aspects of semiconductor materials. The determined parameters give essential information on advanced semiconductor films, and are indispensable when developing new materials.