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Versatile high-temperature oven chamber

Anton Paar HTK 1200N is designed for powder X-ray diffraction in reflection and transmission geometries with environmental heating of the sample up to 1200 ºC in air, inert atmosphere or vacuum. Thanks to the heater geometry there is virtually no restriction on sample thickness, therefore, along with organic or inorganic powders, high-temperature behavior of bulk samples can also be studied with this chamber. The thermocouple is placed right underneath the sample for accurate temperature measurement and control. Optional oscillation of the sample table helps to improve particle statistics for powder XRD in reflection geometry. An optional capillary spinner attachment enables measurements in transmission geometry for highly air-sensitive materials or samples with a strong tendency to preferred orientations. Sample preparation and sample exchange is very easy and straightforward.

The new generation of versatile materials research diffraction systems

The long and successful history of PANalytical's Materials Research Diffractometers (MRD) continues with a new generation – X’Pert³ MRD and X’Pert³ MRD XL. The improved performance and reliability of the new platform have added more analytical capability and power for X-ray scattering studies in: • advanced materials science • scientific and industrial thin film technology • metrological characterization in semiconductor process development Both systems handle the same wide range of applications with full wafer mapping up to 100 mm (X’Pert³ MRD) or 200 mm (X’Pert³ MRD XL).

Versatile chamber for work at low to medium-high temperatures

The Anton Paar TTK 450 chamber is designed for powder X-ray diffraction in reflection geometry in the temperature range from -193 ºC to +450 ºC in air, inert atmosphere or vacuum. If cooling below -10 ºC is not required, compressed air cooling can be used instead of liquid nitrogen cooling. The thermocouple is placed right underneath the sample for accurate temperature measurement and control. Optionally a beam knife can be placed above the sample for improved low-angle background.

Versatile chamber for work at low to medium-high temperatures

The Anton Paar TTK 600 chamber is the successor of the TTK 450 low-temperature chamber. This new TTK 600 low-temperature chamber is equipped with an improved heating/cooling mechanism, extending the temperature range from -190 ºC to +600 ºC. TTK 600 enables in situ powder XRD measurements in both reflection and transmission and can be used with air, inert atmosphere or vacuum. If cooling below -10 ºC is not required, compressed air cooling can be used instead of liquid nitrogen cooling. Thermocouple is placed right underneath the sample for accurate temperature measure and control. Optional beam knife or beam stop can be placed inside the chamber for the improved low angle background in reflection or transmission, respectively.