HTK 1200N

HTK 1200N

From conventional XRD to basic SAXS and reflectivity measurements

Thanks to the design of HTK 1200N the range of possible applications is broad, from the conventional in situ X-ray diffraction on powder and bulk samples to basic thin film analysis and residual stress measurements. Furthermore, basic small-angle X-ray scattering (SAXS) and total X-ray scattering for pair distribution function analysis (PDF) can also be done with this chamber.